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dc.contributor.authorGerasimov, Vitaliy-
dc.contributor.authorГерасимов, Віталій Вікторович-
dc.contributor.authorMitsa, Vladimir-
dc.contributor.authorМица, Володимир-
dc.date.accessioned2020-03-24T12:27:28Z-
dc.date.available2020-03-24T12:27:28Z-
dc.date.issued1997-
dc.identifier.urihttp://dspace.msu.edu.ua:8080/jspui/handle/123456789/5237-
dc.descriptionGerasimov V. Concentration profiles of elements and structure of a-Si1-xNx:H films / V. Gerasimov, V. Mitsa // Fizika A, 1997. - vol. 6. - Issue 1. - С. 61-66en_US
dc.description.abstractSIMS profiles of a-Si1-xNx:H films having different composition have been measured. The distribution of hydrogen in nitrided films bears a fluctuating character and its whole content decreases at x < 0.06. In all films, Na impurity is observed and its content on the film surface exceeds that of all other components. In the region of small contents of nitrogen, the position of the absorption edge in a-Si1-xNx:H films does not change with respect to its position in a-Si:H. According to the analysis of IR spectra of a-Si1-xNx:H near Si-N bonds, different surroundings are realized.en_US
dc.language.isoenen_US
dc.publisherFizika Aen_US
dc.titleConcentration profiles of elements and structure of a-Si1-xNx:H filmsen_US
dc.typeArticleen_US
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