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Ezzel az azonosítóval hivatkozhat erre a dokumentumra forrásmegjelölésben vagy hiperhivatkozás esetén:
http://dspace.msu.edu.ua:8080/jspui/handle/123456789/5237| Title: | Concentration profiles of elements and structure of a-Si1-xNx:H films |
| Authors: | Gerasimov, Vitaliy Герасимов, Віталій Вікторович Mitsa, Vladimir Мица, Володимир |
| Issue Date: | 1997 |
| Publisher: | Fizika A |
| Abstract: | SIMS profiles of a-Si1-xNx:H films having different composition have been measured. The distribution of hydrogen in nitrided films bears a fluctuating character and its whole content decreases at x < 0.06. In all films, Na impurity is observed and its content on the film surface exceeds that of all other components. In the region of small contents of nitrogen, the position of the absorption edge in a-Si1-xNx:H films does not change with respect to its position in a-Si:H. According to the analysis of IR spectra of a-Si1-xNx:H near Si-N bonds, different surroundings are realized. |
| Description: | Gerasimov V. Concentration profiles of elements and structure of a-Si1-xNx:H films / V. Gerasimov, V. Mitsa // Fizika A, 1997. - vol. 6. - Issue 1. - С. 61-66 |
| URI: | http://dspace.msu.edu.ua:8080/jspui/handle/123456789/5237 |
| Ebben a gyűjteményben: | Статті |
Fájlok a dokumentumban:
| Fájl | Leírás | Méret | Formátum | |
|---|---|---|---|---|
| Concentration_profiles_of_elements_and_structure_of_a-Si1-xNxH_films.pdf | Concentration profiles of elements and structure of a-Si1-xNx:H films | 503.01 kB | Adobe PDF | Megtekintés/Megnyitás |
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